S.V. Babu receives a large plaque from Applied Materials’ Vice President, Nag Patibandla

Clarkson University Professor Emeritus S. V. Babu Honored at Electrochemical Society Conference and Clarkson CMP Reunion

S.V. Babu, Clarkson University Professor Emeritus in the Department of Chemical and Biomolecular Engineering and former Director of the Center for Advanced Materials Processing (CAMP) at Clarkson University was recently honored and celebrated for his immense contributions to the development of the chemical-mechanical planarization (CMP) process which is widely used in semiconductor manufacturing industry.

S.V. Babu receives a large plaque from Applied Materials’ Vice President, Nag Patibandla

A symposium titled “CMP – Past, Present, and Future in Honor of S.V. Babu” at the 245th Electrochemical Society (ECS) Conference on May 27 and 28 in San Francisco was the centerpiece of the celebration. The symposium featured presentations by many of Babu’s 50 PhD students who have carved successful careers in the semiconductor industry after completing their studies at Clarkson. Also featured were many of Babu’s collaborators, who traveled from countries all around the world to attend.

Babu’s contributions to the field of CMP are remarkable, and he is internationally regarded as a leader in understanding the fundamental mechanisms of CMP. He has published more than 200 papers, 30 patents, and multiple books on the subject, including the seminal book Advances in Chemical Mechanical Planarization, first published in 2016 and a second edition in 2022. Further, he received lifetime achievement awards from the International Conference on Planarization/CMP Technology (ICPT) in 2018, along with awards from IBM, Intel, and Applied Materials.

In addition to the symposium, Babu will be honored with a special edition of the ECS Journal of Solid State Science and Technology. Clarkson University professor Jihoon Seo, also an expert in CMP, will lead a team of guest editors from companies like Intel, Micron, Applied Materials, Ebara, and Entegris. More information about the special edition can be found at https://www.electrochem.org/ecsnews/fi-cmp-s-v-babu/.

Clarkson University’s CAMP actively collaborates with companies on advanced materials R&D. CAMP has ongoing research projects with Fortune 500 corporations and emerging startups, spanning various industries including, aerospace, semiconductor, personal care, pharma, etc. CAMP welcomes collaboration with companies of all sizes and looks forward to helping them achieve their research and development objectives.

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