Clarkson University Department of Chemical and Bimolecular Engineering Seminar

“Comprehensive Sustainability Impact Analysis of CMP Slurry Manufacturing”
Ravitej Venkataswamy

Materials Science and Engineering Department

Abstract
The exponential growth of the semiconductor industry has intensified environmental challenges in Chemical Mechanical Planarization (CMP) processes, particularly in slurry manufacturing and usage. This research presents a comprehensive framework for sustainable CMP slurry production through environmental strategies. We develop a robust evaluation system using a sustainability index that incorporates metrics for energy consumption, water usage, and greenhouse gas emissions, enabling manufacturers to make informed selections aligned with their environmental targets. Additionally, we conduct a preliminary comparative analysis of calcined and colloidal ceria synthesis routes and introduce a detailed methodology that includes life cycle inventory assessment and Monte Carlo simulations for uncertainty analysis. Our preliminary findings indicate that processes such as calcination, hydrothermal synthesis, and wet-mechanical milling are the most energy-intensive stages in slurry production.

The developed sustainability index and methodology serve as an industry benchmark, allowing manufacturers to evaluate and optimize their processes to reduce environmental impact. This work aligns with the semiconductor industry’s sustainability goals, including prominent chip maker’s target of a 75% reduction in emissions per unit and 95% water recycling by 2030. Keywords: Chemical Mechanical Planarization, Sustainability, Ceria Slurry Synthesis, Semiconductor Wednesday, 11/04/2024 at 4:30 pm

CAMP 176

Short bio:
Ravitej Venkataswamy is a PhD student in the Materials Science and Engineering Department at Clarkson University in NY, USA. His research primarily revolves around the field of Chemical Mechanical Planarization (CMP) under the supervision of Dr. Jihoon Seo. Ravitej focuses on various aspects of CMP research, including oxide, copper, and silicon carbide polishing. His current work aims at developing a robust sustainability framework for selecting eco-friendly CMP consumables, working closely with industry partners such as semiconductor manufacturers and CMP consumable vendors. Under the guidance of Dr. Jihoon Seo and Dr. Alan Rossner, Ravitej is actively contributing to advancements in sustainable CMP practices.

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